Citation link:
http://dx.doi.org/10.25819/ubsi/10248
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In_situ_coupling_applied_voltage.pdf | 3.42 MB | Adobe PDF | View/Open |
Dokument Type: | Article | metadata.dc.title: | In situ coupling applied voltage and synchrotron radiation: operando characterization of transistors | Authors: | Davydok, Anton Luponosov, Yuriy N. Ponomarenko, Sergey A. Grigorian, Souren |
Institute: | Department Physik | Free keywords: | OFETs, Operando studies, nanoGIWAXS, nanoGIXD, α,ω-dihexyl-α-quaterthiophene | Dewey Decimal Classification: | 530 Physik | GHBS-Clases: | UIOS UIUO YEP |
Issue Date: | 2022 | Publish Date: | 2023 | Source: | Nanoscale research letters ; 17, article number 22. - https://doi.org/10.1186/s11671-022-03662-y | Abstract: | A compact voltage application setup has been developed for in situ electrical testing of organic field effect transistors in combination with X-ray scattering studies at a synchrotron beamlines. Challenges faced during real condition in-operando test of newly developed OFETs originated an idea of creation of a new setup which excludes number of factors that make experiments complicated. The application of the setup is demonstrated on a prototype of an organic transistors based on α,ω-dihexyl-α-quaterthiophene molecules. The new setup allows to monitor material structural changes by X-ray scattering under applied voltage conditions and their direct correlations. The versatile setup eliminates possible shadowing effects and short circuits due to misalignment of the contacts. The electrical stability of the prototypes was characterized by the application of different voltage values. Corresponding structural changes were monitored by grazing X-ray scattering technique before, during and after the voltage was applied. The selected oligothiophene material with proved transistor properties shows high stability and directional anisotropy under applied voltage conditions. Thanks to a compact and flexible design of the setup, different type of small dimension devices could be studied under external voltage conditions at various synchrotron beamlines. |
Description: | Finanziert im Rahmen der DEAL-Verträge durch die Universitätsbibliothek Siegen |
DOI: | http://dx.doi.org/10.25819/ubsi/10248 | URN: | urn:nbn:de:hbz:467-24424 | URI: | https://dspace.ub.uni-siegen.de/handle/ubsi/2442 |
Appears in Collections: | Geförderte Open-Access-Publikationen |
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